
SCCO2-CWS®
Advanced Packaging Superfluid Cleaning Equipment
SCCO2-CWS® advanced packaging superfluid cleaning equipment is specifically designed for 2.5D and 3D advanced packaging flux cleaning processes. Engineered with advanced and patented supercritical carbon dioxide technology, SCCO2-CWS ensures the thorough and rapid removal of micro-gap and low-standoff flux residue from CoW (Chip-on-Wafer). By eliminating water usage, the SCCO-CWS minimizes environmental impact and reduces material compatibility risks as well.
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Key Features

Supporting Various Wafer Thicknesses and <8mm Warpage

Exclusive Patented Superfluid Cleaning Technology

Micro-scale Gap Cleaning Ability

Water-free Process

Environmentally Friendly Anhydrous Process


